Custom-made sputtering deposition equipment
Difficult materials, various substrate shapes, and applications! Capable of accommodating a very wide range of substrate sizes.
We offer a "custom-made sputtering deposition system (PVD)" that can handle everything from research and prototyping to mass production. We support coating for decorative and surface protection purposes, as well as research and development to mass production of thin film devices such as flexible electronics, optical communication technologies, thin film solar cells, and batteries. We can assemble the system according to your needs, including sample size, deposition target materials, and batch processes. 【Features】 - Unique technology that accommodates all metal and oxide targets - Wafer sizes from 1mm x 1mm to 300mm x 560mm, with thicknesses up to 25mm - No need for hardware or software changes for deposition on different sizes - Thin Film Equipment recommended by research institutions across Europe *You can download the English version of the materials. For more details, please feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
